Klorin trifluorida

Klorin trifluorida adalah sebuah senyawa interhalogen dengan rumus kimia ClF₃. Senyawa ini berwujud gas tak berwarna, beracun, korosif, dan sangat reaktif. Senyawa ini sering dijual dalam bentuk cair (dengan diberi tekanan tinggi), dan dalam wujud ini ClF₃ berwarna kuning kehijauan muda. Senyawa ini banyak digunakan sebagai bahan bakar roket, berbagai proses di industri semikonduktor,^[9][10][11] pengolahan bahan bakar nuklir,,^[12] serta proses-proses industri lainnya.^[13]

Klorin trifluorida

Skeletal formula of chlorine trifluoride with some measurements Spacefill model of chlorine trifluoride
Nama
Nama IUPAC (sistematis) Trifluoro-λ3-chlorane[1] (substitutive)
Nama lain Chlorotrifluoride
Penanda
Nomor CAS	7790-91-2 Y
Model 3D (JSmol)	Gambar interaktif Gambar interaktif
3DMet	{{{3DMet}}}
ChEBI	CHEBI:30123 Y
ChemSpider	23039 Y
Nomor EC
Referensi Gmelin	1439
MeSH	chlorine+trifluoride
PubChem CID	24637
Nomor RTECS	{{{value}}}
Nomor UN	1749
CompTox Dashboard (EPA)	DTXSID90893948
InChI InChI=1S/ClF3/c2-1(3)4 Y Key: JOHWNGGYGAVMGU-UHFFFAOYSA-N Y InChI=1/ClF3/c2-1(3)4 Key: JOHWNGGYGAVMGU-UHFFFAOYAB
SMILES F[Cl](F)F [F-].[F-].F[Cl++]
Sifat
Rumus kimia	ClF3
Massa molar	92,45 g·mol−1
Penampilan	Colorless gas or greenish-yellow liquid
Bau	sweet, pungent, irritating, suffocating[2][3]
Densitas	3.779 g/L[4]
Titik lebur	−7.634 °C (−13.709 °F; −7.361 K)[4]
Titik didih	1.175 °C (2.147 °F; 1.448 K)[4] (decomposes @ 180 °C (356 °F; 453 K))
Kelarutan dalam air	Exothermic hydrolysis[5]
Kelarutan	Reacts with benzene, toluene, ether, alcohol, acetic acid, selenium tetrafluoride, nitric acid, sulfuric acid, alkali, hexane.[5] Soluble in CCl4 but can be explosive in high concentrations.
Tekanan uap	175 kPa
Suseptibilitas magnetik (χ)	-26.5·10−6 cm3/mol[6]
Viskositas	91.82 μPa s
Struktur
Bentuk molekul	T-shaped
Termokimia[7]
Kapasitas kalor (C)	63.9 J K−1mol−1
Entropi molar standar (So)	281.6 J K−1mol−1
Entalpi pembentukan standar (ΔfHo)	−163.2 kJ mol−1
Energi bebas Gibbs (ΔfG)	−123.0 kJ mol−1
Bahaya
Bahaya utama	explosive when exposed to organics, reacts violently with water[3]
Lembar data keselamatan	natlex.ilo.ch
Piktogram GHS
Keterangan bahaya GHS	{{{value}}}
Titik nyala	noncombustible [3]
Dosis atau konsentrasi letal (LD, LC):
LC50 (konsentrasi median)	95 ppm (rat, 4 hr) 178 ppm (mouse, 1 hr) 230 ppm (monkey, 1 hr) 299 ppm (rat, 1 hr) [8]
Batas imbas kesehatan AS (NIOSH):
PEL (yang diperbolehkan)	C 0.1 ppm (0.4 mg/m3)[3]
REL (yang direkomendasikan)	C 0.1 ppm (0.4 mg/m3)[3]
IDLH (langsung berbahaya)	20 ppm[3]
Senyawa terkait
Senyawa terkait	Chlorine pentafluoride Chlorine monofluoride Bromine trifluoride Iodine trifluoride
Kecuali dinyatakan lain, data di atas berlaku pada suhu dan tekanan standar (25 °C [77 °F], 100 kPa).
Y verifikasi (apa ini YN ?)
Referensi

Referensi

1. "Chlorine trifluoride – Compound Summary". PubChem Compound. USA: National Center for Biotechnology Information. 16 September 2004. Identification and Related Records. Diakses tanggal 9 October 2011.
2. ClF3/Hydrazine Diarsipkan 2007-02-02 di Wayback Machine. at the Encyclopedia Astronautica.
3. "NIOSH Pocket Guide to Chemical Hazards #0117". National Institute for Occupational Safety and Health (NIOSH).
4. Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 4.58. ISBN 978-1-4398-5511-9.
5. Chlorine fluoride (ClF3) Diarsipkan 2013-10-29 di Wayback Machine. at Guidechem Chemical Network
6. Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 4.132. ISBN 978-1-4398-5511-9.
7. Haynes, William M., ed. (2011). CRC Handbook of Chemistry and Physics (edisi ke-92nd). CRC Press. hlm. 5.8. ISBN 978-1-4398-5511-9.
8. "Chlorine trifluoride". Immediately Dangerous to Life and Health. National Institute for Occupational Safety and Health (NIOSH).
9. Habuka, Hitoshi; Sukenobu, Takahiro; Koda, Hideyuki; Takeuchi, Takashi; Aihara, Masahiko (2004). "Silicon Etch Rate Using Chlorine Trifluoride". Journal of the Electrochemical Society. 151 (11): G783–G787. doi:10.1149/1.1806391.
10. Xi, Ming et al. (1997) Templat:US Patent "Process for chlorine trifluoride chamber cleaning"
11. Habuka, Hitoshi (2012). "Etching of Silicon Carbide Using Chlorine Trifluoride Gas". Physics and Technology of Silicon Carbide Devices. doi:10.5772/50387. ISBN 978-953-51-0917-4.
12. Board on Environmental Studies and Toxicology, (BEST) (2006). Acute Exposure Guideline Levels for Selected Airborne Chemicals: Volume 5. Washington D.C.: National Academies Press. hlm. 40. ISBN 978-0-309-10358-9. (available from National Academies Press)
13. Boyce, C. Bradford and Belter, Randolph K. (1998) Templat:US Patent "Method for regenerating halogenated Lewis acid catalysts"