Loading AI tools
Chemical compound From Wikipedia, the free encyclopedia
Copper silicide can refer to either Cu4Si[2] or pentacopper silicide, Cu5Si.
Identifiers | |
---|---|
3D model (JSmol) |
|
ChemSpider | |
ECHA InfoCard | 100.032.066 |
EC Number |
|
PubChem CID |
|
CompTox Dashboard (EPA) |
|
| |
| |
Properties | |
Cu5Si | |
Molar mass | 345.8155 g/mol |
Appearance | silver powder |
Melting point | 825 °C (1,517 °F; 1,098 K) |
Hazards | |
NIOSH (US health exposure limits): | |
PEL (Permissible) |
TWA 1 mg/m3 (as Cu)[1] |
REL (Recommended) |
TWA 1 mg/m3 (as Cu)[1] |
IDLH (Immediate danger) |
TWA 100 mg/m3 (as Cu)[1] |
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
|
Pentacopper silicide is a binary compound of silicon with copper. It is an intermetallic compound, meaning that it has properties intermediate between an ionic compound and an alloy. This solid crystalline material is a silvery solid that is insoluble in water. It forms upon heating mixtures of copper and silicon.
Copper silicide thin film is used for passivation of copper interconnects, where it serves to suppress diffusion and electromigration and serves as a diffusion barrier.[3][better source needed]
Copper silicides are invoked in the Direct process, the industrial route to organosilicon compounds. In this process, copper, in the form of its silicide, catalyses the addition of methyl chloride to silicon. An illustrative reaction affords the industrially useful dimethyldichlorosilane:[4]
Seamless Wikipedia browsing. On steroids.
Every time you click a link to Wikipedia, Wiktionary or Wikiquote in your browser's search results, it will show the modern Wikiwand interface.
Wikiwand extension is a five stars, simple, with minimum permission required to keep your browsing private, safe and transparent.