5 nm process
Semiconductor manufacturing processes / From Wikipedia, the free encyclopedia
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In semiconductor manufacturing, the International Roadmap for Devices and Systems defines the "5 nm" process as the MOSFET technology node following the "7 nm" node. In 2020, Samsung and TSMC entered volume production of "5 nm" chips, manufactured for companies including Apple, Marvell, Huawei and Qualcomm.[1][2]
The term "5 nm" has no relation to any actual physical feature (such as gate length, metal pitch or gate pitch) of the transistors being five nanometers in size. According to the projections contained in the 2021 update of the International Roadmap for Devices and Systems published by IEEE Standards Association Industry Connection, a "5 nm node is expected to have a contacted gate pitch of 51 nanometers and a tightest metal pitch of 30 nanometers".[3] However, in real world commercial practice, "5 nm" is used primarily as a marketing term by individual microchip manufacturers to refer to a new, improved generation of silicon semiconductor chips in terms of increased transistor density (i.e. a higher degree of miniaturization), increased speed and reduced power consumption compared to the previous 7 nm process.[4][5]