俄歇电子能谱学(Auger electron spectroscopy,簡稱AES),是一种表面科学和材料科学的分析技术。因此技術主要藉由俄歇效應進行分析而命名之。產生於受激發的原子的外層電子跳至低能階所放出的能量被其他外層電子吸收而使後者逃脫離開原子,這一連串事件稱為俄歇效應,而逃脫出來的電子稱為俄歇電子。1953年,俄歇电子能谱逐漸開始被實際應用於鑑定樣品表面的化學性質及組成的分析[1][2][3][4]。其特點是俄歇電子來自淺層表面,僅帶出表面的資訊,並且其能譜的能量位置固定,容易分析。
Briggs, David; Martin P. Seah. Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy. Chichester: John Wiley & Sons. 1983. ISBN 0-471-26279-X.
Davis, L. E. (ed.). Modern Surface Analysis: Metallurgical Applications of Auger Electron Spectroscopy (AES) and X-ray Photoelectron Spectroscopy (XPS). Warrendale: The Metallurgical Society of AIME. 1980. ISBN 0-89520-358-8.
An Introduction to Surface Analysis by XPS and AES, J.F.Watts, J.Wolstenholme, published by Wiley & Sons, 2003, Chichester, UK, ISBN978-0-470-84713-8
Burhop, E. H. S. Le rendement de fluorescence. Journal de Physique et le Radium. July 1955, 16 (7): 625–629. doi:10.1051/jphysrad:01955001607062500(法语).
Paparazzo, E. Comment on 'AES and SAM microanalysis of structure ceramics by thinning and coating the backside.' Yu and Jin. Surface and Interface Analysis. December 2001, 31 (12): 1110–1111. doi:10.1002/sia.1144.
"Auger Electron Spectroscopy", J. Wolstenholme, published by Momentum Press, LLC, 2015, New York, ISBN978-1-60650-681-3 (print), 978-1-60650-682-0 (e-book)
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