800 nm process
Semiconductor manufacturing processes with a 800 nm MOSFET technology node From Wikipedia, the free encyclopedia
The 800 nm process (800 nanometer process) is a level of semiconductor process technology that was reached in the 1987–1990 timeframe, by companies, such as Intel, ATI Technologies, and IBM.[1]
The 800 nm process refers to the minimum size that could be reliably produced. The smallest transistors and other circuit elements on a chip made with this process were around 800 nanometers wide.
Products featuring 800 nm manufacturing process
- 50-MHz i486DX CPU launched in 1991 was manufactured using this process.[2]
- Both 25/50 and 33/66 MHz Intel486 DX2 CPU using this process.[3]
- Early version of Intel486 SX2 using this process.[4]
- Intel uses this ETOX-III (EPROM Tunnel Oxide) process technology for these Flash Memory modules.[5]
- microSPARC I launched in 1992
- First Intel P5 Pentium CPUs at 60 MHz and 66 MHz launched in 1993
References
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